Crystal growth method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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1566162, 1566163, 156607, 156DIG70, 422248, C30B 1102, C30B 1700, C30B 2700, C30B 2940

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active

049465449

ABSTRACT:
The problem of spurious inclusions of excess Group V material in the growth of III-V crystals is reduced by including, along with the raw material (12) in the crucible, a quantity (13) of the elemental Group V material and encapsulating with boric oxide (14). The crucible is contained within a growth vessel (19) which is in turn contained within a pressure vessel (16) which is first evacuated and then filled to a high pressure with an inert gas such as argon. The inert gas is one which is lighter in weight than the vaporized Group V material, and which is at a higher pressure than the equilibrium pressure of the vaporized Group V material at the melting temperature of the III-V compound. The vaporized Group V material displaces the argon in the growth vessel (19). The inventive process also reduces defects in the grown crystal.

REFERENCES:
patent: 3301637 (1967-01-01), Kucza et al.
patent: 3520810 (1970-07-01), Plaskett et al.
patent: 3649193 (1972-03-01), Deyris
patent: 3877883 (1975-04-01), Berkman et al.
patent: 3898051 (1975-08-01), Schmid
patent: 4404172 (1983-09-01), Gault
patent: 4840699 (1989-06-01), Khattak et al.
Bachmann, K. J. and Buehler, E., "Phase Equilibria and Vapor Pressures of Pure Phosphorus and of the Indium/Phosphorus System and Their Implications Regarding Crystal Growth of InP," J. Electrochem. Soc.: Solid-State Science and Technology, vol. 121, No. 6, Jun. 1974, pp. 835-846.
Pamplin, Brian R., "Growth of Single Crystals of GaAs in Bulk and Thin Film Form," Crystal Growth, Pergamon Press Ltd., 1975, p. 165.

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