Crosslinkable aqueous developable photoresist compositions and m

Details Crosslinkable aqueous developable photoresist compositions and m Crosslinkable aqueous developable photoresist compositions and m

1991-11-22

1994-03-22

Berman, Susan

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430272, 430280, 430312, 430315, G03C 556, G03C 173, G03C 176

Patent

active

052963322

ABSTRACT:
High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.

REFERENCES:
patent: 4404272 (1983-09-01), Stahlhofen
patent: 4810601 (1989-03-01), Allen et al.
patent: 5073474 (1991-12-01), Schwalm et al.
patent: 5206111 (1993-04-01), Wilharm et al.
patent: 5227276 (1993-07-01), Roeschert et al.
patent: 5234791 (1993-08-01), Dammel et al.
Reck et al.; SPIE Regional Technical Conference on Photopolymers, Ellenville, N.Y. 63 (1988) "Novel Photresist Design Based on Electrophilic Aromatic Substitution".

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