Cross-linked polyalkenyl phenol based photoresist compositions

Details Cross-linked polyalkenyl phenol based photoresist compositions Cross-linked polyalkenyl phenol based photoresist compositions

1985-04-22

1986-07-15

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430326, 430176, 430192, 430197, 430905, G03C 1495, G03C 152, G03C 172

Patent

active

046006834

ABSTRACT:
A film forming, radiation sensitive resist composition having improved thermal stability and a reduced dissolution rate in developer solutions, comprised of a sensitizer and a polyalkenyl phenol such as a polyvinyl phenol cross-linked, prior to irradiation, with a poly-functional cross-linking agent such as dimethylol p-cresol or hexamethylene tetramine.

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patent: 4061799 (1977-12-01), Brewer et al.
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4121936 (1978-10-01), Matsuda et al.
patent: 4247616 (1981-01-01), Vikesland et al.
patent: 4409317 (1983-10-01), Shiraishi
patent: 4415653 (1983-11-01), Lai et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.

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