Cross-linked conductive polymers and antistat layers employing t

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430 18, 430270, 430273, 430523, 430527, G03C 1492

Patent

active

053188780

ABSTRACT:
Cross-linked conductive polymer, coating compositions and light sensitive elements containing at least one antistat layer where the cross-linked polymer is a copolymer of a vinylbenzene sufonic acid and an ethylenically unsaturated monomer containing at least one primary hydroxyl group cross-linked with a methoxyalkylmelamine.

REFERENCES:
patent: 3651003 (1972-03-01), Bechtold
patent: 3826788 (1974-07-01), Froelich
patent: 4225665 (1980-09-01), Schadt, III
patent: 4415697 (1983-11-01), Peng
patent: 4668748 (1987-05-01), Hardam et al.
patent: 4960687 (1990-10-01), Cho

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Cross-linked conductive polymers and antistat layers employing t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cross-linked conductive polymers and antistat layers employing t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cross-linked conductive polymers and antistat layers employing t will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-792124

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.