Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-06-07
2000-07-11
McDonald, Rodney
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429815, 20429823, 20429825, 20429826, 20429828, 20429827, C23C 1434
Patent
active
060867280
ABSTRACT:
A cross flow system for metalizing compact discs, capable of being interposed in-line in the production of the compact discs after premastering, mastering, electro-forming, and molding includes a vacuum chamber having diametrically opposed vacuum locks and multiple metalization sources in the form of magnetrons, with a preferred cross flow including the introduction of a disc to be metalized through one lock and the exit of the metalized disc through the diametrically opposite lock. The double vacuum lock diametrically opposed cross flow system eliminates the problems of throughput limitations, high rate deposition, substrate pitting, and software complexity due to indexing which makes prior systems both costly and inefficient. The system also permits processing of more than one substrate or compact disc title such that multiple titled compact discs can be processed simultaneously.
REFERENCES:
patent: 4588343 (1986-05-01), Garrett
patent: 4808291 (1989-02-01), Denton et al.
patent: 5518599 (1996-05-01), Schwartz et al.
Bierwagen Klaus
Schwartz Vladimir
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