Cross-flow diffusion furnace

Details Cross-flow diffusion furnace Cross-flow diffusion furnace

1987-11-02

1989-08-08

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

Work support

118500, C23C 1644, B05C 1302

Patent

active

048542660

ABSTRACT:
A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.

REFERENCES:
patent: 3297501 (1967-01-01), Reisman
patent: 3675619 (1972-07-01), Burd
patent: 4131659 (1978-12-01), Authier et al.
patent: 4182749 (1980-01-01), Green et al.
patent: 4309240 (1982-01-01), Zaferes
patent: 4365587 (1982-12-01), Hirose et al.
patent: 4525382 (1985-06-01), Sugioku
patent: 4545327 (1985-10-01), Campbell et al.
patent: 4547404 (1985-10-01), Campbell et al.
patent: 4573431 (1986-03-01), Sarkozy
patent: 4778561 (1988-10-01), Ghanbari

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