Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-07-11
2006-07-11
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07074525
ABSTRACT:
Non-uniformity and image shortening are substantially reduced in an image printed on a substrate using a photolithographic mask in which the mask pattern includes at least one lines and spaces array adjacent to at least one clear region. At least one line feature is incorporated within the clear region of the mask pattern and is disposed in proximity to the lines and spaces array. The line feature has a line width that is smaller than a minimum resolution of the optical projection system. The image is printed by illuminating the photolithographic mask and projecting light transmitted through the photolithographic mask onto the substrate using the optical projection system.
REFERENCES:
patent: 5585210 (1996-12-01), Lee et al.
patent: 5725973 (1998-03-01), Han et al.
patent: 5821014 (1998-10-01), Chen et al.
Brunner Timothy Allan
Butt Shahid
Speno Patrick
Wu Chung-Hsi J.
Infineon - Technologies AG
International Business Machines - Corporation
Rosasco S.
Slater & Matsil L.L.P.
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