Etching a substrate: processes – Forming or treating mask used for its nonetching function
Reexamination Certificate
2011-08-16
2011-08-16
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Forming or treating mask used for its nonetching function
C216S002000, C216S011000, C216S041000, C216S047000, C216S058000, C216S072000, C430S004000, C430S005000
Reexamination Certificate
active
07998355
ABSTRACT:
A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of depositing a layer of transmissive material having a predefined percentage transmission on a substrate; depositing a layer of opaque material on the transmissive material; etching a portion of the substrate, the substrate being etched to a depth based on an etching selectivity between the transmissive layer and the substrate; exposing a portion of the transmissive layer by etching the opaque material; etching the exposed portion of the transmissive layer so as to expose an upper surface of the substrate; where the exposed portions of the substrate and the etched portions of the substrate exhibit a predefined phase shift relative to one another with respect to an illumination signal.
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Broeke Douglas Van Den
Chen Jang Fung
Wampler Kurt E.
ASML Masktools B.V.
Norton Nadine G
Pillsbury Winthrop Shaw & Pittman LLP
Remavege Christopher M
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