Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate
2007-02-22
2009-06-02
Richards, N Drew (Department: 2895)
Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Ion implantation of dopant into semiconductor region
Reexamination Certificate
active
07541266
ABSTRACT:
A technique for and structures for camouflaging an integrated circuit structure. The technique includes the use of a light density dopant (LDD) region of opposite type from the active regions resulting in a transistor that is always off when standard voltages are applied to the device.
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Baukus James P.
Chow Lap-Wai
Clark Jr. William M.
HRL Laboratories LLC
Richards N Drew
Singal Ankush K
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