Corrosion protection for micromechanical metal layers

Details Corrosion protection for micromechanical metal layers Corrosion protection for micromechanical metal layers

1995-10-26

1997-12-16

Nguyen, Nam

Etching a substrate: processes

Etching of semiconductor material to produce an article...

216 11, 216 46, 216100, 1566441, C23F 100

Patent

active

056981120

ABSTRACT:
A metal layer provided for micromechanical components such as sensors or actuators is surrounded with a protective layer of, for example, TiN for protection against the influence of an etchant that is employed for etching out a cavity in a sacrificial layer of, for example, silicon dioxide. The lower part and the upper part of this protective layer are produced as layers. A supplementary protective layer is conformally deposited into the etching holes produced for etching the cavity out and is anisotropically re-etched, so that the metal layer is also laterally covered by the protective layer.

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"Scream I: A Single Mask, Single-Crystal Silicon Process For Microelectromechanical Structures" by Keven A. Shaw et al, 1993 IEEE, pp. 155-159 Proceedings--Micro Electro Mech. Sys. Feb. 1993.

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