Correlation of end-of-line data mining with process tool...

Details Correlation of end-of-line data mining with process tool... Correlation of end-of-line data mining with process tool...

2002-03-21

2008-07-15

Fleurantin, Jean B (Department: 2162)

Data processing: database and file management or data structures

Database design

Data structure types

C707S793000, C716S030000, C700S100000, C710S121000, C710S302000, C710S304000

Reexamination Certificate

active

07401066

ABSTRACT:
One embodiment of the present invention is a process tool optimization system that includes: (a) a data mining engine that analyzes end-of-line yield data to identify one or more process tools associated with low yield; and (b) in response to output from the analysis, analyzes process tool data from the one or more process tools to identify one or more process tool parameters associated with the low yield.

REFERENCES:
patent: 5097141 (1992-03-01), Leivian et al.
patent: 5222210 (1993-06-01), Leivian
patent: 5819245 (1998-10-01), Peterson et al.
patent: 5897627 (1999-04-01), Leivian et al.
patent: 6314379 (2001-11-01), Hu et al.
patent: 6526547 (2003-02-01), Breiner et al.
patent: 6580960 (2003-06-01), Nicholson
patent: 2001/0051836 (2001-12-01), Lamey, Jr. et al.
patent: 2002/0022937 (2002-02-01), Funakoshi
patent: 2002/0032888 (2002-03-01), Ott et al.
patent: 10032322 (2002-01-01), None
patent: 0233745 (2002-04-01), None
Mike Gardner et al, Data mining solves tough semiconductor manufacturing problems, Year of Pub: 2000, ACM Press, pp. 376-383.
James Pak et al., Advance Methods for Analysis of Lot-to-Lot Yiel Variation,1997, IEEE, pp. E17-E20.
Fan et al., Data Mining and Fault Diagnosis on Wafer Acceptence Test Data and In-line Manufacturing Data, 2001, IEEE, pp. 171-174.
Mieno et al., Yield Improvement Using Mining System, 1999, IEEE, pp. 391.
Peter Borden, The Nature of Particule Generation in Vacuum Process Tools, 1990, IEEE, pp. 189-194.
Fan et al., Shewma: An End-of-Line SPC Scheme Using Wafer Acceptance Test Data, 2000, IEEE, pp. 344-358.
Guo et al., Intelligent Process Diagnosis Based on End-of-Line Electrical Test Data, 1996, IEEE, pp. 347-354.
Perfecto et al., Improving Yields Through Effective Diagnostics: A MCM-D/C Example, 1998, IEEE, pp. 80-86.
“Automatic in-line to end-of-line defect correlation using FSRAM test structure for quick killer defect identification” by D. Wilson et al., Proc. IEEE 1994 Intl. Conf. Microelectron. Test Structures, vol. 7, Mar. 1994, pp. 160-163.
“Predictive process control for sub-0.2 um lithography,” T. E. Zavecz et al.SPIE Microlithography, vol. 3998, No. 48, Mar. 2000.
“Data Mining for Yield Improvements” R. Kittler et al.,Proc. Int'l Conf. on Modeling and Analysis of Semiconductor Manuf(MASM2000), May 2000.
“Solving Tough Semiconductor Manufacturing Problems Using GKS Data Mining Technology,” M. Gardner et al., The 11thAnnual IEEE/SEMI Advanced Semiconductor Manuf. Conf., Sep. 12-14, 2000, pp. 1-25.

Affiliated with

Also associated with

Rating

Correlation of end-of-line data mining with process tool... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Correlation of end-of-line data mining with process tool..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Correlation of end-of-line data mining with process tool... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3962712