Correction of optical proximity effects by intensity...

Details Correction of optical proximity effects by intensity... Correction of optical proximity effects by intensity...

2006-02-14

2008-12-30

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S071000, C430S030000

Reexamination Certificate

active

07471375

ABSTRACT:
A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.

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