Correction of optical metrology for focus offset

Details Correction of optical metrology for focus offset Correction of optical metrology for focus offset

2007-04-13

2008-11-11

Lauchman, L. G. (Department: 2877)

Optics: measuring and testing

Focal position of light source

C356S125000

Reexamination Certificate

active

07450225

ABSTRACT:
A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis. Focus calibration is used to determine the optical response of the metrology device to the focus offset. The modeled data is adjusted based on the optical response to the focus offset and the model regression analysis fits for the focus offset as a variable parameter along with the sample characteristics that are to be measured. Once an adequate fit is determined, the values of the sample characteristics to be measured are reported. The adjusted modeled data may be stored in a library, or alternatively, modeled data may be adjusted in real-time.

REFERENCES:
patent: 5307175 (1994-04-01), Seachman
patent: 5880844 (1999-03-01), Seng
patent: 6611292 (2003-08-01), Tsai et al.
patent: 6763141 (2004-07-01), Xu et al.
patent: 7196300 (2007-03-01), Watkins et al.

Affiliated with

Also associated with

Rating

Correction of optical metrology for focus offset does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Correction of optical metrology for focus offset, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Correction of optical metrology for focus offset will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4038000