Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-06-27
2010-06-08
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07735053
ABSTRACT:
A validation/correction method is provided for design data or mask data by which a pattern which becomes critical in a process is extracted in advance so that the pattern can be corrected. Consequently, the process spec is achieved in a short period of time after OPC or process proximity effect correction (PPC).
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Bowers Brandon W
Chiang Jack
Nixon & Vanderhye P.C.
Sharp Kabushiki Kaisha
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