Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2006-10-10
2006-10-10
Nguyen, Henry Hung (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000
Reexamination Certificate
active
07119883
ABSTRACT:
An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.
REFERENCES:
patent: 4571045 (1986-02-01), Uematsu
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5361292 (1994-11-01), Sweatt
patent: 5631721 (1997-05-01), Stanton et al.
patent: 6014252 (2000-01-01), Shafer
patent: 6097474 (2000-08-01), McCullough et al.
patent: 6186632 (2001-02-01), Chapman et al.
patent: 6195201 (2001-02-01), Koch et al.
patent: 6295119 (2001-09-01), Suzuki
patent: 6307682 (2001-10-01), Hoffman et al.
patent: 6476905 (2002-11-01), Li
patent: 6522387 (2003-02-01), Mulkens
patent: 6563907 (2003-05-01), Kubiak et al.
patent: 2004/0189967 (2004-09-01), Ottens et al.
Aberrations, 1 page, printed from http://www.mellesgriot.com/glossary/wordlist/-glossarydetails.asp?wID=78, (printed Jul. 3, 2003).
Bjorkholm, J.E., “EUV Lithography—The Successor to Optical Lithography?”Intel Technology Journal Q3'98, pp. 1-8, (1998).
Braat, J., “Design of an optical system towards an isoplanatic prescription,” pp. 1-12, undated.
Braat, J., “Extreme UV lithography, a candidate for next-generation lithography,” pp. 1-10, (Oct. 18, 2000).
DoITPoMS Teaching and Learning Packages: Resolution and imaging, 5 pages, printed from http://www.msm.cam.ac.uk/doitpoms/tlplib/CD1/resolution.php, (printed Jul. 15, 2004).
Edmund Industrial Optics: Condenser Lenses, 2 pages, printed from http://www.edmundoptics.com-/IOD/DisplayProduct.cfm?Productid=2032, (Copyright 2001).
Gwyn, C., “The timeline puts the screws to extreme ultraviolet lithography, but engineers rise to the challenge,”oe Magazine, 6 pages, printed from http://oemagazine.com-/fromTheMagazine/jun02/euv.html, (Copyright 2000-2002).
Lens Combinations: Aberration Balancing, 2 pages, printed from http://www.mellesgriot.com/products/optics/fo—4—2.htm, (Copyright 2002).
Michalski, J., “What is Telecentricity?”, 5 pages, printed from http://www.edmundoptics.com/techsupport/DisplayArticle.cfm?articleid=261, (Copyright 2001).
Spring, K.R. and Davidson, M.W.,Basic Concepts and Formulas in Microscopy: Depth of Field and Depth of Focus, 4 pages, printed from http://www.microscopyu.com-/articles/formulas/forumalsfielddepth.html, (Copyright 2000-2004).
Tichenor, D.A. et al., “Initial Results from the EUV Engineering Test Stand,” 10 pages, undated.
Watanabe, Y.,Canon EUVL Plans, Nanotechnology & Advanced System Research Laboratories, 20 pages of slides, undated.
Loopstra Erik
Nelson Michael L.
Roux Stephen
ASML Holding N.V.
Nguyen Henry Hung
Sterne Kessler Goldstein & Fox P.L.L.C.
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