Correcting a mask pattern by selectively updating the...

Details Correcting a mask pattern by selectively updating the... Correcting a mask pattern by selectively updating the...

2007-08-28

2007-08-28

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

11005866

ABSTRACT:
Correcting a mask pattern includes accessing the mask pattern segmented into segments. An attribute value is established for each segment, where the attribute value for a segment describes an attribute of the segment. The following is repeated for one or more of the attribute values to generate a corrected mask pattern: selecting segments using one or more attribute values; calculating a current correction value for each of the selected segments with respect to previously selected segments updated according to previously calculated correction values; and updating the selected segments according to the current correction values.

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“Proteus, Progen, Prospector Full-Chip Optical Proximity Correction”, Data Sheet, Synopsys, © 2004 Synopsys, Inc., 9 pages, Oct. 2004.

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