Correcting 3D effects in phase shifting masks using...

Details Correcting 3D effects in phase shifting masks using... Correcting 3D effects in phase shifting masks using...

2009-01-27

2011-10-04

Whitmore, Stacy (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Layout generation

C716S050000, C430S005000, C382S144000, C382S145000

Reexamination Certificate

active

08032845

ABSTRACT:
Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.

REFERENCES:
patent: 5403682 (1995-04-01), Lin
patent: 6609245 (2003-08-01), Liebmann et al.
patent: 2003/0068564 (2003-04-01), Liu et al.
patent: 2003/0200524 (2003-10-01), Liebmann et al.
patent: 2004/0096752 (2004-05-01), Liebmann et al.
patent: 2004/0168147 (2004-08-01), Dai et al.
patent: 2004/0191650 (2004-09-01), Pierrat
patent: 2005/0014074 (2005-01-01), Liebmann et al.
patent: 2005/0042527 (2005-02-01), Pierrat
patent: 2005/0262468 (2005-11-01), Mesuda et al.

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