Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2006-08-29
2006-08-29
Huynh, Andy (Department: 2818)
Semiconductor device manufacturing: process
With measuring or testing
C438S014000, C438S710000, C324S671000
Reexamination Certificate
active
07098050
ABSTRACT:
A method of measuring electrical characteristics of a gate dielectric. The gate dielectric is local annealed by directing a highly localized energy source at the measurement area, such that the measurement area is brought to an annealing temperature while surrounding structures are not significantly heated. While heating the measurement area, a flow of a gas containing a percentage of hydrogen, deuterium, or water vapor at a flow rate is directed to the measurement area. A charge is inducted on the measurement area and the electrical characteristics of the gate dielectric are measured using non contact electrical probing.
REFERENCES:
patent: 5936408 (1999-08-01), Scaman
Bouche Eric F.
Edelstein Sergio
Pei Shiyou
Shi Jianou
Zhang Xiafang
Huynh Andy
KLA-Tencor Technologies Corporation
Luedeka Neely & Graham P.C.
Nguyen Thinh T
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