Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1982-12-30
1983-11-22
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156643, 156656, 156666, 156345, 204192EC, 204192E, 252 792, 252 791, C23F 100, B44C 122, C03C 1500, C03C 2506
Patent
active
044167253
ABSTRACT:
The invention is a room-temperature dry process for texturing copper on polyester, to improve adhesion of coatings to the copper surface through mechanical as well as chemical bonding. An iodine plasma is produced by backfilling an evacuated chamber with iodine and applying an RF potential. The iodine plasma includes both positive and negative iodine ions. Unprotected surface areas of the copper form a copper iodide; when the copper iodide is removed, the remaining surface is highly textured. The associated polyester is not damaged. The copper iodide is conveniently removed by a 10% hydrochloric acid solution which has no damaging effects on the associated polyester or on the metallic copper, or on associated polyester in a plastic laminated with copper.
REFERENCES:
patent: 3445264 (1969-05-01), Haines
patent: 3573454 (1971-04-01), Andersen
patent: 3661747 (1972-05-01), Byrnes et al.
patent: 4198278 (1980-04-01), Mehada et al.
patent: 4243506 (1981-01-01), Ikeda et al.
patent: 4264813 (1981-04-01), Chandrashekar et al.
patent: 4265722 (1981-05-01), Faul et al.
Hudson, "Ion Beam Texturing," J. Vac. Sci. Technol., vol. 14, #1, Jan./Feb. 1977, pp. 286-289.
Curmi et al., "Surface Texturing of Copper by Sputter Etching with Applications for Solar Selective Absorbing Surface," J. Vac. Sci. Technol. 17(6), Nov./Dec. 1980, pp. 1320-1325.
Hanak et al., "Effect of Secondary Electrons and Negative Ions on Sputtering of Films," J. Vac. Sci. Technol., vol. 13, No. 1, Jan./Feb. 1976, pp. 406-409.
Kashihira et al., "Source for Negative Halogen Ions," Rev. Sci. Instrum., vol. 48, No. 2, Feb. 1977, pp. 171-172.
Cuomo et al., "The Significance of Negative Ion Formation in Sputtering and SIMS Analysis".
Middleton et al., "A Close to Universal Negative Ion Source*," Nuclear Instruments and Methods 118 (1974) pp. 329-336.
Cuomo et al., "A New Concept for Solar Energy Thermal Conversion," Applied Physics Letters, vol. 26, No. 10, May 15, 1975, pp. 557-559.
Cuomo Jerome J.
Leary Pamela A.
Yee Dennis S.
International Business Machines - Corporation
Kling Carl C.
Powell William A.
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