Copper contamination control of in-line probe instruments

Details Copper contamination control of in-line probe instruments Copper contamination control of in-line probe instruments

1998-12-15

2000-11-21

Gulakowski, Randy

Chemistry: analytical and immunological testing

Metal or metal containing

Cu, ag, au

436 49, 134 6, G01N 3300, G01N 3320, B08B 700

Patent

active

061501751

ABSTRACT:
Radio frequency photo conductive decay is used to monitor a small piece of high-grade silicon to determine if copper contamination has been removed from a probe tool. A probe tool is placed in contact with a small "waferette" of silicon repeatedly until the copper signal is diminished, indicating that the tool may be used for other products without concern for copper contamination.

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