Copper-containing C4 ball-limiting metallurgy stack for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S687000

Reexamination Certificate

active

10776076

ABSTRACT:
The invention relates to a ball-limiting metallurgy stack for an electrical device that contains at least one copper layer disposed upon a Ti adhesion metal layer. The ball-limiting metallurgy stack resists Sn migration toward the upper metallization of the device.

REFERENCES:
patent: 3663184 (1972-05-01), Wood et al.
patent: 4290079 (1981-09-01), Carpenter et al.
patent: 4360142 (1982-11-01), Carpenter et al.
patent: 4505029 (1985-03-01), Owyang et al.
patent: 4514751 (1985-04-01), Bhattacharya
patent: 4880708 (1989-11-01), Sharma et al.
patent: 5137845 (1992-08-01), Lochon et al.
patent: 5376584 (1994-12-01), Agarwala
patent: 5384283 (1995-01-01), Gegenwarth et al.
patent: 5492235 (1996-02-01), Crafts et al.
patent: 5648686 (1997-07-01), Hirano et al.
patent: 5736456 (1998-04-01), Akram
patent: 5773359 (1998-06-01), Mitchell et al.
patent: 5885891 (1999-03-01), Miyata et al.
patent: 5903058 (1999-05-01), Akram
patent: 6111321 (2000-08-01), Agarwala
patent: 6130170 (2000-10-01), David et al.
patent: 6222279 (2001-04-01), Mis et al.
patent: 6224690 (2001-05-01), Andricacos et al.
patent: 6232212 (2001-05-01), Degani et al.
patent: 6313651 (2001-11-01), Hembree et al.
patent: 6348730 (2002-02-01), Yi et al.
patent: 6387793 (2002-05-01), Yap et al.
patent: 6426282 (2002-07-01), Saigal et al.
patent: 6452270 (2002-09-01), Huang
patent: 6489229 (2002-12-01), Sheridan et al.
patent: 6495449 (2002-12-01), Nguyen
patent: 6667230 (2003-12-01), Chen et al.
patent: 2002/0086520 (2002-07-01), Chiang
patent: 2001189334 (2001-07-01), None
“Chromium Copper Step Phasing”, IBM Technical Disclosure Bulletin, (Aug. 1, 1977), pp. 1005-1006.
Tummala, Rao et al., “Microelectronics Packaging Handbook, Semiconductor Packaging”, Part 2, 2nd Edition, (1997), pp. 129-139.
Annala, P., et al., “Electroplated Solder Alloys for Flip Chip Interconnections”, Physica Scripta, T69, pp. 115-118 (1997).
Datta, M., et al. “Electrochemical Fabrication of Mechanically Robust PbSn C4 Interconnection”, Journal of the Electrochemical Society, 142 (11), 7 p., (Nov. 1995).
Honma, S., et al. “Effectiveness of Thin-Film Barrier Metals for Eutectic Solder Bumps”, Microelectronics International, 14 (3), pp. 47-50 (Sep. 1997).
Liu, C.Y., et al., “Electron microscopy study of interfacial reaction between eutectic SnPb and Cu/Ni (v)/A1 thin film metallization”, Journal of Applied Physics, 87 (2), pp. 750-754, Jan. 15, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Copper-containing C4 ball-limiting metallurgy stack for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Copper-containing C4 ball-limiting metallurgy stack for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copper-containing C4 ball-limiting metallurgy stack for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3780171

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.