Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1998-01-23
2000-03-28
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430326, 430313, 430317, 430318, G03F 740, G03F 730
Patent
active
060429976
ABSTRACT:
The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
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Barclay George G
Breyta Greg
Cronin Michael F.
Dellaguardia Ronald A.
Ito Hiroshi
Cairns S. Matthew
Corless Peter F.
Frickey Darryl P.
Hamilton Cynthia
IBM Corporation
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