Copolymer useful for positive photoresist and chemical amplifica

Details Copolymer useful for positive photoresist and chemical amplifica Copolymer useful for positive photoresist and chemical amplifica

1997-12-26

1999-11-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 526259, 526313, G03F 7004

Patent

active

059897759

ABSTRACT:
A copolymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition having the copolymer and a photoacid generator. The photoresist can allow for a good pattern shape even though a post-baking is taken in a somewhat delayed time and for a use of any radiation, such as uv light, deep uv light and charged particle beam. Also, it is superior in storage stability and resolution so that it is useful for the high integration of semiconductor devices. The polymer ranges, in polystyrene-reduced average molecular weight, from 1,000 to 1,000,000. The polymer is represented by the following repeating pattern: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a methyl; R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen; 1, m, n each is a repeating number satisfying the condition that 0.3<1/(m+n)<0.9, 0.1<m/(1+n)<0.6 and 0.01<n/(1+m)<0.5; h and g, which may be different and the same, each are an integer of 0-8; and Am represents NR.sub.7 R.sub.8, a cyclic secondary amine, or a heterocyclic secondary amine containing an oxygen or sulfur atom, wherein R.sub.7 and R.sub.8 independently represent a hydrogen atom, an alkyl group, an aryl group or a phenyl group.

REFERENCES:
patent: 5334485 (1994-08-01), Van Iseghem et al.
patent: 5412050 (1995-05-01), Watanabe et al.
patent: 5693452 (1997-12-01), Aoai et al.
patent: 5851728 (1998-12-01), Kim et al.
patent: 5882835 (1999-03-01), Park et al.

Affiliated with

Also associated with

Rating

Copolymer useful for positive photoresist and chemical amplifica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Copolymer useful for positive photoresist and chemical amplifica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copolymer useful for positive photoresist and chemical amplifica will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1219870