Copolymer, polymer mixture, and radiation-sensitive resin...

Details Copolymer, polymer mixture, and radiation-sensitive resin... Copolymer, polymer mixture, and radiation-sensitive resin...

2006-09-12

2006-09-12

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C525S216000, C525S219000, C526S308000, C526S313000

Reexamination Certificate

active

07105269

ABSTRACT:
1. A copolymer having recurring units of the following formulas (1), (2), and (3),wherein R1, R4, R5, and R6are a hydrogen atom or a methyl group, R2, R3, and R7represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.

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