Conversion of an SOI design layout to a bulk design layout

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S479000, C438S480000

Reexamination Certificate

active

07579221

ABSTRACT:
An SOI design layout is converted to a bulk design layout. According to a method of converting a first semiconductor design layout based on an Silicon-on-Insulator (SOI) process to a second semiconductor design layout based on a bulk process, an insulator layer of the SOI process beneath active devices in the first semiconductor design layout is removed. A conductive sub-surface structure for routing voltage is added to the first semiconductor design layout. Further, the active devices from the SOI process are converted to the bulk process to form the second semiconductor design layout without requiring a relayout of the first semiconductor design layout on a semiconductor surface. The bulk design layout is utilized to fabricate a semiconductor device having a plurality of active devices.

REFERENCES:
patent: 6272666 (2001-08-01), Borkar et al.
patent: 6385761 (2002-05-01), Breid
patent: 6470482 (2002-10-01), Rostoker et al.
patent: 6530068 (2003-03-01), Cao et al.
patent: 6609227 (2003-08-01), Bradley et al.
patent: 6782516 (2004-08-01), Rittman et al.
patent: 6861374 (2005-03-01), Oyamatsu
patent: 6875665 (2005-04-01), Hokazono et al.
patent: 6877144 (2005-04-01), Rittman et al.
patent: 6907587 (2005-06-01), Rittman et al.
patent: 6918100 (2005-07-01), Kresh et al.
patent: 6928626 (2005-08-01), McGaughy et al.
patent: 7051295 (2006-05-01), Narendra et al.
patent: 2002/0038446 (2002-03-01), Ioudovski
patent: 2004/0128631 (2004-07-01), Ditzel et al.
patent: 2004/0143808 (2004-07-01), Hegde et al.
patent: 2005/0028113 (2005-02-01), Lin et al.
patent: 2005/0097496 (2005-05-01), Koike et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Conversion of an SOI design layout to a bulk design layout does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Conversion of an SOI design layout to a bulk design layout, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conversion of an SOI design layout to a bulk design layout will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4102258

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.