Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-02-23
1996-02-27
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118728, 156345, 1566431, 20419212, 20419232, 20429815, 427569, H01L 2100, C23C 100
Patent
active
054945232
ABSTRACT:
A plasma processing apparatus including a wafer supporting pedestal which is designed to reduce particle trapping phenomena. In a region of the pedestal surface which surrounds or abuts the wafer, the pedestal has a permittivity which is substantially equal to or greater than that of the wafer surface. As a result, the sheath boundary is reshaped to reduce particle trapping.
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Gupta Anand
Rhoades Charles S.
Steger Robert J.
Applied Materials Inc.
Breneman R. Bruce
Chang Joni Y.
Taylor John P.
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