Controlling device for substrate processing apparatus and...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S108000

Reexamination Certificate

active

07844357

ABSTRACT:
A target value that serves as a control value with feed forward control is optimized. A TL performs a feed forward and a feedback control of a PM. A storage unit stores a plurality of recipes indicating different processing sequences, and a target value that serves as a control value when performing an etching process. A communication unit causes an IMM to measure a processing state of the wafer and receives measurement information. A computation unit computes a feedback value for the current wafer processed in the current cycle, based on pre-processing and post-processing measurement information for the wafer. An update unit updates the target value using the feedback value. A recipe adjustment unit changes the recipe to change the process performed in the same PM. When the process is performed after changing, the updated target value is used to perform feed forward control of the wafer in the same PM.

REFERENCES:
patent: 6625497 (2003-09-01), Fairbairn et al.
patent: 7047095 (2006-05-01), Tomoyasu
patent: 7158851 (2007-01-01), Funk
patent: 2002/0155629 (2002-10-01), Fairbairn et al.
patent: 2003/0015699 (2003-01-01), Su
patent: 2003/0045961 (2003-03-01), Nakao
patent: 2003/0165755 (2003-09-01), Mui et al.
patent: 2004/0267399 (2004-12-01), Funk
patent: 2005/0198609 (2005-09-01), Hwang et al.
patent: 2006/0048697 (2006-03-01), Houge et al.
patent: 2006/0200265 (2006-09-01), Hsu et al.
patent: 2004-207703 (2004-07-01), None
patent: 2003-0019256 (2003-03-01), None

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