Controlled amine poisoning for reduced shrinkage of features for

Details Controlled amine poisoning for reduced shrinkage of features for Controlled amine poisoning for reduced shrinkage of features for

1997-10-03

2000-05-02

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430311, G03F 700

Patent

active

060570849

ABSTRACT:
A process for reducing shrinkage of photolithographic features formed in a photoresist including exposing the photoresist to at least one material selected from the group consisting of at least one amine, at least one amide, at least one aldehyde, and nitrogen.

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