Control system for a two chamber gas discharge laser system

Coherent light generators – Particular active media – Gas

Reissue Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S055000, C372S057000, C372S025000

Reissue Patent

active

RE042588

ABSTRACT:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.

REFERENCES:
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4455658 (1984-06-01), Sutter, Jr.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5189678 (1993-02-01), Ball et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5852621 (1998-12-01), Sandstrom
patent: 5863017 (1999-01-01), Larson et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6330261 (2001-12-01), Ishihara et al.
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6532247 (2003-03-01), Spangler et al.
patent: 6538737 (2003-03-01), Sandstrom et al.
patent: 6567163 (2003-05-01), Sandstrom
patent: 6567450 (2003-05-01), Myers et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6671294 (2003-12-01), Kroyan et al.
patent: 6693939 (2004-02-01), Klene et al.
patent: 6704339 (2004-03-01), Lublin et al.
patent: 6704340 (2004-03-01), Ershov et al.
patent: 6721340 (2004-04-01), Fomenkov et al.
patent: 6750972 (2004-06-01), Sandstrom et al.
patent: 2002/0006149 (2002-01-01), Spangler et al.
patent: 2002/0048288 (2002-04-01), Kroyan et al.
patent: 2002/0101589 (2002-08-01), Sandstrom et al.
patent: 2002/0154668 (2002-10-01), Knowles et al.
patent: 2002/0191654 (2002-12-01), Klene et al.
patent: 2003/0043876 (2003-03-01), Lublin et al.
patent: 2003/0091087 (2003-05-01), Ershov et al.
U.S. Appl. No. 09/608,543, Fomenkov et al., filed Jun. 30, 2000.
U.S. Appl. No. 10/173,190, Sandstrom et al., filed Jun. 14, 2002.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Control system for a two chamber gas discharge laser system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control system for a two chamber gas discharge laser system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control system for a two chamber gas discharge laser system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2739436

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.