Control of X-ray beam spot size

X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis

Reexamination Certificate

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C378S089000, C378S205000

Reexamination Certificate

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07453985

ABSTRACT:
A method for analysis of a sample includes directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles. For each of the different angles, a respective offset of the beam in a direction transverse to the beam axis is determined. While sensing the radiation scattered from the sample at each of the different elevation angles in succession, a transverse correction is applied to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.

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