Control of plasma process by use of harmonic frequency component

Details Control of plasma process by use of harmonic frequency component Control of plasma process by use of harmonic frequency component

1992-08-21

1994-06-28

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511131, 31511191, 31511171, 20419213, H01J 724

Patent

active

053250192

ABSTRACT:
The present invention provides for a technique for taking advantage of the intrinsic electrical non-linearity of processing plasmas to add additional control variables that affect process performance. The technique provides for the adjustment of the electrical coupling circuitry, as well as the electrical excitation level, in response to measurements of the reactor voltage and current and to use that capability to modify the plasma characteristics to obtain the desired performance.

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Pending Patent Application Serial No. 893,475, Filed Jun. 4, 1992 "Harmonic and Subharmonic Isolator for Plasma Discharge", Paul A. Miller.
"Electrical characterization of rf plasmas;" Paul A. Miller; SPIE, vol. 1594, Process Module Metrology, Control, and Clustering; pp. 179-188; Sep. 1991.

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