Control of nitrogen and/or oxygen in silicon via nitride oxide p

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156617SP, 156DIG89, 156DIG64, 148DIG22, 148DIG41, C30B 2702

Patent

active

045914095

ABSTRACT:
The disclosure relates to a method for producing single crystal silicon from a polycrystalline silicon melt wherein dopants such as oxygen and nitrogen are uniformly distributed in the crystal both along the crystal axis and radially therefrom. This is accomplished by identifying the correct species in the melt and above the melt and determining the thermochemical equilibrium between the two chemical species which lead to a change of the composition of the silicon single crystal during the entire growth process. This approach effectively circumvents the segregation coefficient during the growth process through the control of the concentration of the dopants in the melt.

REFERENCES:
patent: 3615878 (1971-10-01), Chang et al.
patent: 4090851 (1978-05-01), Berkman et al.
patent: 4400232 (1983-08-01), Ownby et al.
patent: 4415401 (1983-11-01), Wald et al.
patent: 4443411 (1984-04-01), Kalejs
Chemical Abstract 96(8): 60961f, Carlberg et al., 1982.

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