Control of MTJ tunnel area

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S421000, C438S003000

Reexamination Certificate

active

06903396

ABSTRACT:
A method of forming a magnetic tunnel junction memory element and the resulting structure are disclosed. A magnetic tunnel junction memory element comprising a thick nonmagnetic layer between two ferromagnetic layers. The thick nonmagnetic layer has an opening in which a thinner tunnel barrier layer is disposed. The resistance of a magnetic tunnel junction memory element may be controlled by adjusting the surface area and/or thickness of the tunnel barrier layer without regard to the surface area of the ferromagnetic layers.

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Zhi G. Wang, et al.—“Feasibility of Ultra-Dense Spin-Tunneling Random Access Memory,” IEEE Transactions on Magnetics, vol. 33, No. 6, Nov. 1997.

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