Control of gas content in process liquids for improved megasonic

Details Control of gas content in process liquids for improved megasonic Control of gas content in process liquids for improved megasonic

1997-02-18

1998-09-01

Warden, Jill

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 3, 134 21, B08B 312, B08B 310

Patent

active

058006265

ABSTRACT:
An efficient cleaning process of microelectronics devices requires lower levels of megasonic power, lower temperature and much lower concentrations of chemicals. The method controls the effectiveness of megasonics-assisted cleaning of microelectronics devices by securing a gas concentration level in the cleaning solution, such that at the process temperature the solution is partially saturated with the gas. The gas concentration can be controlled either at the plant-wide level or, preferably, at the point of use. In the latter case, two water supply inputs are provided, one of vacuum-degassed water and the other of gas-saturated water. Process water in the desired gas concentration is then obtained by mixing water from the two sources in an appropriate ratio, which resulting mixture is fed to the wafer cleaning vessel.

REFERENCES:
patent: 4865060 (1989-09-01), Shibano
patent: 4907611 (1990-03-01), Shibano
patent: 5000795 (1991-03-01), Chung et al.
patent: 5014727 (1991-05-01), Aigo
patent: 5176756 (1993-01-01), Nakashima et al.
patent: 5279316 (1994-01-01), Miranda
patent: 5415191 (1995-05-01), Mashimo et al.
patent: 5656097 (1997-08-01), Olesen et al.

Affiliated with

Also associated with

Rating

Control of gas content in process liquids for improved megasonic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control of gas content in process liquids for improved megasonic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control of gas content in process liquids for improved megasonic will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-265976