Contrast-enhancing agent for photolithography

Details Contrast-enhancing agent for photolithography Contrast-enhancing agent for photolithography

1988-12-14

1990-05-15

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430339, 430311, G03C 1733

Patent

active

049257706

ABSTRACT:
The invention provides a novel contrast-enhancing agent for photolithography which is used as an overcoating on a positive-working photoresist layer for enhancing the contrast of the photoresist in a low-contrast exposure to light. The composition comprises, in addition to a watersoluble polymer, e.g., poly(vinyl alcohol), poly(vinyl pyrroilidone) and pullulan, as the binder, a specific photo-bleachable organic compound having, in a molecule, at least one nitrogen-containing heterocyclic aromatic structure represented by the general formula ##STR1## in which Z is a divalent group to form the heterocyclic aromatic ring with the nitrogen atom, X is an anionic group of monovalency and n is a positive integer of, e.g., 1 or 2.

REFERENCES:
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patent: 4677049 (1987-06-01), Griffing et al.
patent: 4702996 (1987-10-01), Griffing et al.
patent: 4745042 (1988-05-01), Sasago et al.
patent: 4804614 (1989-02-01), Halle
patent: 4816380 (1989-03-01), Covington et al.

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