Contoured-tub fermi-threshold field effect transistor and method

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257327, 257403, H01L 2976

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active

055436544

ABSTRACT:
A Fermi-threshold field effect transistor includes a contoured-tub region of the same conductivity type as the source, drain and channel regions and having nonuniform tub depth. The contoured-tub is preferably deeper under the source and/or drain regions than under the channel region. Thus, the tub-substrate junction is deeper under the source and/or drain regions than under the channel region. The diffusion capacitance is thereby reduced compared to a tub having a uniform tub depth, so that a high saturation current is produced at low voltages. The contoured-tub may be formed by an additional implant into the substrate using the gate as a mask.

REFERENCES:
patent: Re32800 (1988-12-01), Han et al.
patent: 3653978 (1972-04-01), Robinson et al.
patent: 3789504 (1974-02-01), Jaddam
patent: 3872491 (1975-03-01), Hanson et al.
patent: 4042945 (1977-08-01), Lin et al.
patent: 4092548 (1978-05-01), Beilstein, Jr. et al.
patent: 4108686 (1978-08-01), Jacobus, Jr.
patent: 4274105 (1981-06-01), Crowder et al.
patent: 4491807 (1985-01-01), Hoover
patent: 4697198 (1987-09-01), Komori et al.
patent: 4701775 (1987-10-01), Cosentino et al.
patent: 4737471 (1988-04-01), Shirato et al.
patent: 4771012 (1988-09-01), Yabu et al.
patent: 4819043 (1989-04-01), Yazawa et al.
patent: 4831422 (1989-06-01), Ohno
patent: 4841346 (1989-06-01), Noguchi
patent: 4899202 (1990-02-01), Blake et al.
patent: 4907048 (1990-03-01), Huang
patent: 4928156 (1990-05-01), Alvis et al.
patent: 4984043 (1991-01-01), Vinal
patent: 4990974 (1991-02-01), Vinal
patent: 4994872 (1991-02-01), Nishizawa et al.
patent: 5119152 (1992-06-01), Mizuno
patent: 5151759 (1992-09-01), Vinal
patent: 5192990 (1993-03-01), Stevens
patent: 5194923 (1993-03-01), Vinal
patent: 5369295 (1994-11-01), Vinal
patent: 5371396 (1994-11-01), Vinal et al.
patent: 5374836 (1994-12-01), Vinal et al.
patent: 5440160 (1995-08-01), Vinal
"Depleted Implant MOSFET", IBM Technical Disclosure, vol. 32, No. 10B, Mar. 1990, pp. 235-249.
G. Shahidi, Fabrication of CMOS on Ultrathin SOI Obtained by Epitaxial Lateral Overgrowth and Chemical-Mechanical Polishing, IEDM vol. 90, pp. 587-590, 1990.
A. Kamgar et al., Utlra-High Speed CMOS Circuits in Thin SIMOX Films, IEDM vol. 89, pp. 829-832, 1989.
S. Odanaka, et al., A New Half-Micrometer P-Channel MOSFET with Efficient Punchthrough Stops, IEEE Transactions on Electron Devices, vol. ED-33, No. 3, Mar., 1986, pp. 317-321.
S. J. Hillenius, et al., Gate Material Work Function Considerations for 0.5 Micron CMOS, IEEE, pp. 147-150, 1985.
Adele E. Schmitz, et al., High Performance Subhalf-Micrometer P-Channel Transistors for CMOS VLSI, IEDM 84, pp. 423-426.
S. Chiang, et al., Optimization of Sub-Micron P-Channel FET Structure, IEEE, pp. 534-535, 1983.
E. Takeda, et al., Submicron MOSFET Structure for Minimizing Channel Hot-Electron Injection, 1981 Symposium on VLSI Technology, Hawaii (Sep./1981). Dig. Tech. Papers pp. 22-23.
E. Sun, et al., The Junction MOS (JMOS) Transistor--A High Speed Transistor for VLSI, IEEE, pp. 791-794, 1980.
K. Nishiuchi, et al., A Normally-Off Type Buried Channel MOSFET for VLSI Circuits, IEDM Technical Digest, 1979, pp. 26-29.
M. Hswe, et al., Characteristics of P-Channel MOS Field Effect Transistors with Ion-Implanted Channels, Solid-State Electronics, vol. 15, pp. 1237-1243, 1972.

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