Continuously optimized solar cell metallization design...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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Details

C438S523000, C438S533000, C382S145000, C382S151000

Reexamination Certificate

active

08084293

ABSTRACT:
An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.

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patent: 2009/0227062 (2009-09-01), Sullivan et al.
patent: 2009/0308439 (2009-12-01), Adibi et al.
patent: 2009/0308440 (2009-12-01), Adibi et al.
patent: 2009155498 (2009-12-01), None
patent: 2010099998 (2010-09-01), None

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