Continuous vacuum vapor deposition system having reduced pressur

Details Continuous vacuum vapor deposition system having reduced pressur Continuous vacuum vapor deposition system having reduced pressur

1989-04-11

1991-03-19

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Chamber seal

118 40, 118718, 118726, 427177, 427289, C23C 1600

Patent

active

050001140

ABSTRACT:
In a continuous vacuum vapor deposition system, a reduced-pressure chamber is partitioned into a plurality of sub-chambers by seal devices each formed by one set of three pinch rolls arrayed in parallel on one plane or a single seal roll, and a pair of seal bars positioned on the same plane on the respective sides of the pinch roll or seal roll. Gaps between the pinch rolls or seal roll and seal bars are adapted to allow the base plate portions on the inlet side and on the outlet side, respectively, to pass therethrough. In each of the reduced-pressure sub-chambers are disposed a pair of deflector rolls so that the base plate portions on the inlet side and on the outlet side may be wrapped respectively around the pinch rolls or seal roll with a wrapping angle of 10 degrees or more.

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"Sputtering Device", 61-266572, Nov. 26, 1986, (Japanese patent publication Abstract).
Official Gazette, Mar. 6, 1906, pp. 55-56.
The Official Gazette of the United States Patent Office, vol. 121, No. 1, Mar. 6, 1906 (p. 56).

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