Continuous process for producing solder bumps on electrodes of s

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 2144

Patent

active

061535036

ABSTRACT:
A process for producing solder bumps on metal electrodes, such as Al electrodes, of a semiconductor wafer, such as silicon wafer, involves the formation of the under bump metallurgies (UBM) on the electrodes. The solder bumps are then formed on the under bump metallurgies by wave soldering. The under bump metallurgies consist of a diffusion barrier layer formed on the metal electrodes, and a wetting layer formed on the diffusion barrier layer.

REFERENCES:
patent: 5053357 (1991-10-01), Lin et al.
patent: 5252180 (1993-10-01), Sang, Jr. et al.
patent: 5316788 (1994-05-01), Dibble et al.
patent: 5376584 (1994-12-01), Agarwala
patent: 5445311 (1995-08-01), Trask et al.
patent: 5492235 (1996-02-01), Crafts et al.
patent: 5511306 (1996-04-01), Denton et al.
patent: 5531021 (1996-07-01), Kolman et al.
patent: 5535936 (1996-07-01), Chong et al.
patent: 5638597 (1997-06-01), Cutting et al.
patent: 5724728 (1998-03-01), Bond et al.
patent: 5773359 (1998-06-01), Mitchell et al.
patent: 5795619 (1998-08-01), Lin et al.
patent: 5856705 (1999-01-01), Ting
patent: 5874043 (1999-02-01), Sarkel et al.
patent: 5910354 (1999-06-01), Meola et al.
A. Ostmann et al., "The Pretreatment of Aluminum Bondpads for Electroless Nickel Bumping", 1993 IEEE, pp. 74-78.
Inaba et al., "Solder Bump Formation Using Electroless Plating and Ultrasonic Soldering", IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. 13, No. 1, Mar. 1990, pp. 119-123.
Judd & Brindley, "Soldering in Electronics Assembly", Newnes Publishing, First published 1992, Chapter 3 and Chapter 7.
Lin & Chao, "Material Interactions of Solder Bumps Produced with Fluxless Wave Soldering", IEEE Transactions on Components, Packaging, and Manufacturing Technology--Part B, vol. 21, No. 1, Feb. 1998, pp. 59-64.
A. Aintila et al., "Electroless Ni/Au Bumps for Flipchip-on-Flex and TAB Applications", IEEE/CPMT Int'l Electronics Manufacturing Technology Symposium, 1994, pp. 160-164.
K. Wong et al., "Application of Electroless Nickel Plating In the Semiconductor Microcircuit Industry", Plating and Surface Finishing 75 (7), pp. 70-76.
R. Aschenbrenner et al., "Electroless Nickel/Copper Plating As a New Bump Metallization", Proceedings of the 1994 International Conference on Multi-Chip Modules, pp. 390-395.
S. M. Sze, VLSI Technology, second edition, pp. 380-417, 1988.
J. M. Oparowski et al., "The Effects of Processing Parameters on the Microstructure and Properties of Sputter-Deposited TiW Thin Film Diffusion Barriers", Thin Solid Films, 153, pp. 313-328, 1987.
Donald P. Seraphim, Ronald C. Lasky and Che-Yu Li, Principles of Electronic Packaging, 1989.
Michael Pecht, Handbook of Electronic Package Design, 1991.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Continuous process for producing solder bumps on electrodes of s does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous process for producing solder bumps on electrodes of s, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous process for producing solder bumps on electrodes of s will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1725251

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.