Continuous gas plasma etching apparatus and method

Details Continuous gas plasma etching apparatus and method Continuous gas plasma etching apparatus and method

1985-07-12

1986-11-25

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156646, 156902, 204298, 20419232, B44C 122, C03C 1500, C03C 2506

Patent

active

046247386

ABSTRACT:
A method and apparatus are disclosed for continuous plasma etching of generally planar workpieces in which the workpieces are introduced into an evacuated chamber containing the plasma, are carried along a continuous processing path and are removed therefrom. The plasma is generated within the chamber and the workpieces are supported within an electrically neutral field within the processing plasma.

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patent: 4282077 (1981-08-01), Reavill
patent: 4289598 (1981-09-01), Engle
patent: 4328081 (1982-05-01), Fazlin
patent: 4371422 (1983-02-01), Eidschun
patent: 4399014 (1983-08-01), Engle
patent: 4431473 (1984-02-01), Okano et al.
patent: 4496420 (1985-01-01), Frohlich

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