Continuous ARC deposition apparatus and method with multiple...

Details Continuous ARC deposition apparatus and method with multiple... Continuous ARC deposition apparatus and method with multiple...

2011-01-18

2011-01-18

Nguyen, Nam X (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

C204S298040, C204S298120, C204S298230, C204S298260

Reexamination Certificate

active

07871506

ABSTRACT:
An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionable in a standby position. An electrical power supply is provided for supplying electrical power to the target held in the operative position to form an arc on an emission surface of the operative target. Means are provided for preparing an emission surface of the target positioned in the standby position to have a predetermined morphology. Alternatively, or in conjunction with the surface preparing means, means are provided for inspecting whether the emission surface of the target positioned in the standby position has a predetermined morphology. Preferably, the positioning means is configured to interchange the at least two targets at a predetermined time.

REFERENCES:
patent: 3853740 (1974-12-01), Kunz
patent: 5518596 (1996-05-01), Anttila et al.
patent: 6031239 (2000-02-01), Shi et al.
patent: 6224718 (2001-05-01), Meyer
patent: 6319369 (2001-11-01), Flynn et al.
patent: 6416635 (2002-07-01), Hurwitt et al.

Affiliated with

Also associated with

Rating

Continuous ARC deposition apparatus and method with multiple... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous ARC deposition apparatus and method with multiple..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous ARC deposition apparatus and method with multiple... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2713110