Contamination suppression in chemical fluid deposition

Details Contamination suppression in chemical fluid deposition Contamination suppression in chemical fluid deposition

2006-01-10

2006-01-10

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S681000, C438S686000

Reexamination Certificate

active

06984584

ABSTRACT:
Methods for depositing materials onto a substrate surface or into a porous solid are disclosed. These methods include suppressing contamination of the deposited materials.

REFERENCES:
patent: 4970093 (1990-11-01), Sievers et al.
patent: 5789027 (1998-08-01), Watkins et al.
patent: 6306754 (2001-10-01), Agarwal

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