Contamination prevention in extreme ultraviolet lithography

Details Contamination prevention in extreme ultraviolet lithography Contamination prevention in extreme ultraviolet lithography

2008-01-17

2011-12-27

Johnston, Phillip A (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C372S087000, C378S119000

Reexamination Certificate

active

08084757

ABSTRACT:
Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. One embodiment of the present invention provides an apparatus for removing debris particles from a beam of radiation comprising a charged species source configured to dispense electrically charged species, and a collecting plate biased electrically opposite to the charged species from the charged species source, wherein the collecting plate and the charged species source are disposed on opposite sides of the beam of radiation, a stream of charged species from the charged species source to the collecting plate intersects the beam of radiation, the stream of charged species is configured to attach and remove debris particles from the beam of radiation by electrostatic force, and the collecting plate is configured to receive the charged species and the debris particles removed from the beam of radiation.

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PCT International Search Report and Written Opinion dated Aug. 26, 2009 for International Application No. PCT/US2009/030209.

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