Contact printing and etching method of making high density recor

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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346 11, 346 76R, 346 76L, 3461351, 346137, 430 5, 430313, 430315, 430318, 430321, 430323, 430325, 430326, 430329, 430330, 358342, 358345, 369285, G03C 500, G01D 1514, G11B 702, H04N 576

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active

044231377

ABSTRACT:
A process for making a radiation-reflecting record carrier, such as a video disc, is provided on which video and/or audio information is stored in an optically readable track in which reflective areas alternate with non-reflective areas, the two areas having different effects on a reading beam in a playback machine so that the information recorded on the carrier may be recovered. The non-reflective areas are formed as apertures in the reflective areas and the underlying substrate is preferably translucent. The disclosed process uses photographic techniques to form a master negative or positive, and to form record carrier replicas from the master.
In one disclosed embodiment of the method and apparatus of this invention, a two-sided recording medium comprises two transparent substrates, each of which supports a perforated metallic, reflecting layer. The two substrates are held together by a layer of adhesive disposed between the two reflecting layers.

REFERENCES:
patent: 3379095 (1968-04-01), Kaprelian
patent: 3751285 (1973-08-01), Ruckert et al.
patent: 3894179 (1975-07-01), Jacobs et al.
patent: 3905817 (1975-09-01), Bakewell
patent: 3942981 (1976-03-01), Sato
patent: 3954469 (1976-05-01), Avanzado et al.
patent: 4061829 (1977-12-01), Taylor
patent: 4063949 (1977-12-01), Uhlig et al.
patent: 4109045 (1978-08-01), Goshima et al.
patent: 4164754 (1979-08-01), Dubois
patent: 4174219 (1979-11-01), Andres et al.
patent: 4252889 (1981-02-01), Tinet et al.
patent: 4258126 (1981-03-01), Hiesinger
patent: 4259433 (1981-03-01), Mizobuchi et al.
patent: 4281057 (1981-07-01), Castellani et al.
patent: 4292388 (1981-09-01), Ikeda et al.
patent: 4292395 (1981-09-01), Wada et al.
patent: 4307172 (1981-12-01), Ishihara et al.
patent: 4321317 (1982-03-01), MacIver
patent: 4352870 (1982-10-01), Howard et al.
DeForest, W. S., "Photoresist Materials and Processes", McGraw-Hill Book Co., 1975, pp. 132-136, 143-149.
One Micron Range Photoresist Imaging: A Practical Approach by David J. Elliott, et al., vol. 22, No. 6, Jun., 1979 issue of Solid State Technology.
Photoresist Technical Manual (Shipley Company).
AZ-1300 Series Positive Photo Resists for Microelectronics (Shipley Co. Doc. PR-004).
AZ-1300 Series Microfiltered Positive Photo Resists (Shipley Co. Doc. MF-1300).
AZ-1400 Series Striation-Free Positive Photo Resists for Microelectronics (Shipley Co. Doc. D-1400B).

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