Contact lithographic fabrication of patterns on large optics

Details Contact lithographic fabrication of patterns on large optics Contact lithographic fabrication of patterns on large optics

1987-03-27

1989-03-07

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430 22, 430323, 430327, 430329, 430330, G03C 500

Patent

active

048106216

ABSTRACT:
An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.

REFERENCES:
patent: 3658526 (1972-04-01), Haugh
patent: 3973964 (1976-08-01), Lange
patent: 4388388 (1983-06-01), Kornbau et al.

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