Contact hole standard test device

Radiant energy – Inspection of solids or liquids by charged particles

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S307000, C250S309000

Reexamination Certificate

active

06897440

ABSTRACT:
A standard test device used for testing a hole of a semiconductor device includes a dummy film on a base surface, and an insulating layer which has an opening penetrating through the insulating layer, so that a part of a top surface of the dummy film is shown through the opening, wherein the dummy film has a predetermined constant thickness around the opening. The standard test device makes it easily possible to measure a thickness of a residual film on the bottom or the contact hole.

REFERENCES:
patent: 3614608 (1971-10-01), Giedd et al.
patent: 4296372 (1981-10-01), Feuerbaum
patent: 4609867 (1986-09-01), Schink
patent: 4859939 (1989-08-01), Gittleman et al.
patent: 4949162 (1990-08-01), Tamaki et al.
patent: 4967152 (1990-10-01), Patterson
patent: 4980639 (1990-12-01), Yoshizawa et al.
patent: 4988877 (1991-01-01), Stokowksi et al.
patent: 5001536 (1991-03-01), Fukuzawa et al.
patent: 5089774 (1992-02-01), Nakano
patent: 5132507 (1992-07-01), Nakano
patent: 5138256 (1992-08-01), Murphy et al.
patent: 5280176 (1994-01-01), Jach et al.
patent: 5327012 (1994-07-01), Yano et al.
patent: 5365034 (1994-11-01), Kawamura et al.
patent: 5412210 (1995-05-01), Todokoro et al.
patent: 5453994 (1995-09-01), Kawamoto et al.
patent: 5493236 (1996-02-01), Ishii et al.
patent: 5614833 (1997-03-01), Golladay
patent: 5637186 (1997-06-01), Liu et al.
patent: 5757198 (1998-05-01), Shida et al.
patent: 5780870 (1998-07-01), Maeda et al.
patent: 5781017 (1998-07-01), Cole et al.
patent: 5801540 (1998-09-01), Sakaguchi
patent: 5815002 (1998-09-01), Nikawa
patent: 5900645 (1999-05-01), Yamada
patent: 5989919 (1999-11-01), Aoki
patent: 6037588 (2000-03-01), Liu et al.
patent: 6127193 (2000-10-01), Bang et al.
patent: 6163159 (2000-12-01), Seyama
patent: 6294919 (2001-09-01), Baumgart
patent: 6317514 (2001-11-01), Reinhorn et al.
patent: 6344750 (2002-02-01), Lo et al.
patent: 6459282 (2002-10-01), Nakamura
patent: 6504393 (2003-01-01), Lo et al.
patent: 6768324 (2004-07-01), Yamada et al.
patent: 50-63990 (1975-05-01), None
patent: A 57-6310 (1982-01-01), None
patent: 62-19707 (1987-01-01), None
patent: A 62-19707 (1987-01-01), None
patent: 6219707 (1987-01-01), None
patent: 62-019707 (1987-01-01), None
patent: 63-009807 (1988-01-01), None
patent: 3-205573 (1991-09-01), None
patent: 4-62857 (1992-02-01), None
patent: 405045147 (1993-02-01), None
patent: A 6-273297 (1994-06-01), None
patent: A 6-273297 (1994-09-01), None
patent: 07066172 (1995-03-01), None
patent: A 8-5528 (1996-01-01), None
patent: A 8-313244 (1996-11-01), None
patent: A 9-61142 (1997-03-01), None
patent: 10-281746 (1998-10-01), None
patent: 10300450 (1998-11-01), None
patent: 11-26343 (1999-01-01), None
patent: 2000-124276 (2000-04-01), None
patent: 2000-164715 (2000-06-01), None
patent: 2000-174077 (2000-06-01), None
patent: 2000-180143 (2000-06-01), None
“An In-Line Contact and Via Hole Inspection Method Using Electron Beam Compensation Current”, Yamada et al., IEEE 1999, Doc. No. 0-7803-5413-3/99/, available from http://www.fabsol.com/us/images/library/21.pdf.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Contact hole standard test device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Contact hole standard test device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Contact hole standard test device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3431121

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.