Constricted glow discharge plasma source

Details Constricted glow discharge plasma source Constricted glow discharge plasma source

1996-09-10

2000-10-24

Bettendorf, Justin P.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511131, 31511141, 31323141, 118723E, H05H 124

Patent

active

061372315

ABSTRACT:
A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

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Miljevic, V. I.; "Some Characteristics of the hollow-anode ion source"; Rev. Sci. Instrum. 63 (4); Apr. 1992; pp 2619-2620.
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