Constant current multi-beam patterning

Details Constant current multi-beam patterning Constant current multi-beam patterning

2009-11-16

2011-11-15

Young, Christopher (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S296000, C430S396000, C430S397000, C430S942000

Reexamination Certificate

active

08057972

ABSTRACT:
The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam and there is a relative motion between the substrate and the pattern definition means. This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multi-beam exposure apparatus during the exposure of the pattern.

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European Search Report for application 09450212.7; dated Sep. 28, 2010, 9 pgs.

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