Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
Patent
1997-10-21
1998-08-11
Niebling, John
Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Diffusing a dopant
438783, H01L 21223
Patent
active
057927014
ABSTRACT:
An apparatus for producing thin film coatings and/or dopant levels on semiconductor wafers or other substrates with improved film growth uniformity (of thickness and composition) and/or dopant uniformity is provided. The apparatus is positioned in a furnace tube between the wafers and a gas inlet. The apparatus comprises a conical shaped baffle.
REFERENCES:
patent: 3753809 (1973-08-01), Gaier et al.
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4835114 (1989-05-01), Satou et al.
patent: 5037775 (1991-08-01), Riseman
patent: 5248253 (1993-09-01), Philipossian et al.
Wang Ying-Lang
Yu Yu-Jen
Ackerman Stephen B.
Mulpuri S.
Niebling John
Saile George O.
Stoffel William J.
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