Conical baffle for reducing charging drift in a particle beam sy

Details Conical baffle for reducing charging drift in a particle beam sy Conical baffle for reducing charging drift in a particle beam sy

1996-10-17

1998-11-17

Anderson, Bruce

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

2505051, H01J 3709

Patent

active

058380060

ABSTRACT:
A conical shaped baffle aperture reduces beam position drift due to electrostatic charging of insulating contamination layers on beam tube walls of a charged particle beam system. The geometric cone angle, aperture size and apex location of the baffle with respect to the source of contamination and secondary radiation are selected so that the inner walls of the baffle and the beam itself are invisible from the source, and therefore remain free of the insulating contamination layers that would otherwise cause charging drift.

REFERENCES:
patent: 4352015 (1982-09-01), Jore et al.
patent: 4508967 (1985-04-01), Boissel et al.
patent: 5185530 (1993-02-01), Norioka et al.
patent: 5362964 (1994-11-01), Knowles et al.

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